Physical Deposition System Plasma Cleaner For Wafers
Physical Deposition System Plasma Cleaner For Wafers
Model Number:
OLT-PS-10L
Compliance:
CE Certified
Minimum Order Quantity:
1
Capacity:
10L
Voltage:
108V-240V 50/60HZ
Warranty:
3 year
Packaging Details:
Export wooden package
Delivery Time:
8-10 day
Physical Deposition System Plasma Cleaner For Wafers
Model no. | OLT-PS-10L | OLT-PS-P5L | OLT-PS-2LA | OLT-PS-2L-B |
Display | LCD touch screen | LED button screen | ||
Power supply | AC 108V-240V 50Hz | |||
Working current | plasma cleaner working current less than 1.2A | |||
Radio frequency power | 100-400w, adjustable | < 200w, adjustable, or customized | ||
RF frequency | 13.56MHz(offset less than 0.4KHz) | 40KHz(offset less than 0.2KHz) | ||
Characteristic impedance | 50 Ohm,automatch | |||
Chamber capacity | 10L | 5L | 2L | 2L |
Vacuum degree | 60Pa-100Pa | 10Pa-100Pa | 30Pa-100Pa | 10Pa-1000Pa |
Cleaning time | 1~6000ml adjustable | |||
Gas flow speed | 10~100ml | |||
Control mode | Manual control or Programmable control | |||
Vacuum pump | CY-4C | |||
Vacuum chamber temper. | less than 65℃ | |||
Cooling type | forced air cooling | |||
Equipment list | plasma cleaner:1set; vacuum pump: 1set; vacuum high-pressure hose: 1pc;O type card: 4pcs;pr | |||
Company Information
Physical Deposition System Plasma Cleaner For Wafers
Lab Atmospheric Plasma Cleaner For Coating And Surface Treatment
A large number of active particles in the plasma, such as a large number of ions, excited molecules, and free radicals, act on the surface of the solid sample, which not only removes the original contaminants and impurities, but also produces an etching effect to roughen the surface of the sample and form many fine pits, which increases the specific surface of the sample,improves the wetting properties of solid surfaces.
Plasma cleaning machine is a new high -tech technology that uses plasma to achieve the effect that conventional cleaning methods cannot achieve.
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